plasma etching processes for interconnect realization in vlsi

Plasma Etching Processes For Interconnect Realization In VLSI
Author: Nicolas Posseme
Publisher: Elsevier
Release Date: 2015-04-14
Pages: 128
ISBN:
Available Language: English, Spanish, And French
EBOOK SYNOPSIS:

This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions. This book focuses on back end of line (BEOL) for high performance device realization and presents an overview of all etch challenges for interconnect realization as well as the current etch solutions proposed in the semiconductor industry. The choice of copper/low-k interconnect architecture is one of the keys for integrated circuit performance, process manufacturability and scalability. Today, implementation of porous low-k material is mandatory in order to minimize signal propagation delay in interconnections. In this context, the traditional plasma process issues (plasma-induced damage, dimension and profile control, selectivity) and new emerging challenges (residue formation, dielectric wiggling) are critical points of research in order to control the reliability and reduce defects in interconnects. These issues and potential solutions are illustrated by the authors through different process architectures available in the semiconductor industry (metallic or organic hard mask strategies). Presents the difficulties encountered for interconnect realization in very large-scale integrated (VLSI) circuits Focused on plasma-dielectric surface interaction Helps you further reduce the dielectric constant for the future technological nodes

Low Energy Electrons
Author: Oddur Ingólfsson
Publisher: CRC Press
Release Date: 2019-04-23
Pages: 418
ISBN:
Available Language: English, Spanish, And French
EBOOK SYNOPSIS:

Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma processing, nanotechnology, and health care, as well as astro- and atmospheric physics and chemistry. The book is packed with illustrative examples, from both fundamental and application sides, features about 130 figures, and lists over 800 references. It may serve as an advanced graduate-level study course material where selected chapters can be used either individually or in combination as a basis to highlight and study specific aspects of low-energy electron–molecule interactions. It is also directed at researchers in the fields of plasma physics, nanotechnology, and radiation damage to biologically relevant material (such as in cancer therapy), especially those with an interest in high-energy-radiation-induced processes, from both an experimental and a theoretical point of view.

Atomic Molecular Ionization By Electron Scattering
Author: K. N. Joshipura
Publisher: Cambridge University Press
Release Date: 2019-01-24
Pages: 278
ISBN:
Available Language: English, Spanish, And French
EBOOK SYNOPSIS:

Covers quantum scattering theories, experimental and theoretical calculations and applications in a comprehensive manner.

Advances In Atomic  Molecular  And Optical Physics
Author:
Publisher: Academic Press
Release Date: 2017-06-07
Pages: 690
ISBN:
Available Language: English, Spanish, And French
EBOOK SYNOPSIS:

Advances in Atomic, Molecular, and Optical Physics, Volume 66, provides a comprehensive compilation of recent developments in a field that is in a state of rapid growth as new experimental and theoretical techniques are used on many problems, both old and new. Topics covered include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics, with timely articles written by distinguished experts that contain relevant review materials and detailed descriptions of important developments in the field. Presents the work of international experts in the field Contains comprehensive articles that compile recent developments in a field that is experiencing rapid growth, with new experimental and theoretical techniques emerging Ideal for users interested in optics, excitons, plasmas, and thermodynamics Topics covered include atmospheric science, astrophysics, surface physics, and laser physics, amongst others

Eighth International IEEE VLSI Multilevel Interconnection Conference  1991
Author: IEEE Electron Devices Society
Publisher: Institute of Electrical & Electronics Engineers(IEEE)
Release Date: 1991-06
Pages: 456
ISBN:
Available Language: English, Spanish, And French
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Proceedings      International IEEE VLSI Multilevel Interconnection Conference
Author:
Publisher:
Release Date: 1989
Pages: 508
ISBN:
Available Language: English, Spanish, And French
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1986 Proceedings
Author:
Publisher:
Release Date: 1986
Pages: 536
ISBN:
Available Language: English, Spanish, And French
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Conference Record
Author:
Publisher:
Release Date: 2003
Pages:
ISBN:
Available Language: English, Spanish, And French
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Extended Abstracts
Author: Electrochemical Society
Publisher:
Release Date: 1990
Pages:
ISBN:
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1995 Symposium On VLSI Technology
Author: IEEE Electron Devices Society
Publisher: IEEE
Release Date: 1995
Pages: 149
ISBN:
Available Language: English, Spanish, And French
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Advanced Metallization For ULSI Applications
Author: Virendra Vir Singh Rana
Publisher:
Release Date: 1992
Pages: 580
ISBN:
Available Language: English, Spanish, And French
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Proceedings
Author:
Publisher:
Release Date: 1987
Pages:
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Available Language: English, Spanish, And French
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VLSI Science And Technology
Author:
Publisher:
Release Date: 1985
Pages:
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Available Language: English, Spanish, And French
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Plasma Process Induced Damage
Author: Moritaka Nakamura
Publisher:
Release Date: 1998-06
Pages: 250
ISBN:
Available Language: English, Spanish, And French
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Optical Microlithography And Metrology For Microcircuit Fabrication
Author: Michel J. Lacombat
Publisher: Society of Photo Optical
Release Date: 1989
Pages: 206
ISBN:
Available Language: English, Spanish, And French
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1987 Proceedings
Author:
Publisher:
Release Date: 1987
Pages: 484
ISBN:
Available Language: English, Spanish, And French
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JJAP
Author:
Publisher:
Release Date: 1994
Pages:
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Proceedings Of The Conference On Solid State Devices
Author:
Publisher:
Release Date: 1982
Pages:
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Solid State Technology
Author:
Publisher:
Release Date: 1986
Pages:
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The Oregon Report
Author:
Publisher:
Release Date: 1978
Pages: 266
ISBN:
Available Language: English, Spanish, And French
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